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- W1640481176 abstract "The adsorption and nucleation of indium on clean (111) silicon surfaces are studied by a UHV molecular beam mass-spectrometric technique. The thermal accommodation of the adatoms on the surface is complete. At very low surface coverages θ, an adsorption energy of 57 kcalmole and a preexponential term τ0 of the Frenkel relation equal to 8 × 10−13 s are found from transient response measurements. The isosteric heat of adsorption Ea varies very slowly with θ, Ea is equal to 59 kcalmole for θ ∼ 10−3 and 57 kcalmole for θ = 0.9. The nucleation occurs without supersaturation in an adsorbed layer near a monolayer." @default.
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- W1640481176 date "1974-06-01" @default.
- W1640481176 modified "2023-10-18" @default.
- W1640481176 title "Chemisorption of indium on (111) silicon substrates" @default.
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- W1640481176 doi "https://doi.org/10.1016/0039-6028(74)90276-3" @default.
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