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- W1641831027 abstract "An inherent SOI device dedicated for the in situ electrical characterization of wafers is the pseudo‐MOS transistor that easily provides a key parameter: Flat‐Band Voltage, VFB. Usual models for this voltage were established for SOI structures with 0,2μm…2μm film thickness and 0,4…100μm oxide thickness. The classical models of VFB, deduced for micronic sizes, present some deficiencies in the nanodevice area. An interface charge about 1012e/cm2 in micronic sizes means 1e/100nm2 equivalent with one electron per device area in the nano‐domain. This paper analyses the flat‐band voltage modeling, due to the consequences of the down‐scaling of the SOI wafers." @default.
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- W1641831027 date "2007-01-01" @default.
- W1641831027 modified "2023-10-18" @default.
- W1641831027 title "More Accurate Models Of The Interfaces Oxide Charge From The Ultra-Thin SOI Films" @default.
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- W1641831027 doi "https://doi.org/10.1063/1.2729741" @default.
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