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- W1645446779 abstract "Effects of OH on the structural relaxation in silica glass were investigated by observing the fictive temperature, which was determined from the position of infrared absorption peak around 2260 cm−1 related to the average Si–O–Si bond angle. It has been found that OH strongly reduces the relaxation time of the α-relaxation, while it slightly decreases its activation energy. Moreover, OH generates a sub-relaxational process. Its relaxation time decreases with increasing the OH concentration." @default.
- W1645446779 created "2016-06-24" @default.
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- W1645446779 date "1999-01-01" @default.
- W1645446779 modified "2023-09-23" @default.
- W1645446779 title "Structural relaxation enhanced by impurities in silica glass" @default.
- W1645446779 doi "https://doi.org/10.1063/1.58531" @default.
- W1645446779 hasPublicationYear "1999" @default.
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