FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W1654027706> ?p ?o ?g. }

• W1654027706 abstract "ABSTRACT In this paper, the polymer composition generated by three different combinations of gas chemistries for oxide etchare studied and the effects of different 02 plasma strip duration on polymer removal are also presented. The etch chemistries used were CHF3/CF4, CO/CF4/CHF3 and C4F8/COICHF3 chemistry. From the X-ray photoelectron spectroscopy (XPS) C isspectra, five distinct peaks are identified which correspond to C-C, C-CF, CF, CF2 and CF3. The C/F ratio is found to behighest for polymer generated by the C4F8/CO/CHF3 chemistry, about 0.8, whereas the C/F ratios for those by CHF3/CF4 andCO/CFICHF3 chemistries are about 0.6. Atomic force microscopy (AFM) images show that the polymer generated by the C4F8/CO/CHF3 chemistry is much rougher than that by CHF3/CF4 and CO/CF4/CHF3 chemistries. The XPS spectra of C is also show a significant decrease in the intensity ofthe more fluorinated carbon peaks (CF3and CF2) after 02 plasma strip. The C/F ratios increased to about i.4 to i .8 after 02 plasma strip. The spectra are similar fordifferent 02 strip times, indicating the decrease is independent of 02 strip duration. From the AFM images, all the polymersformed by CHF3/CF4 and CO/CF4/CHF3 chemistries are rather smooth with no visible change after 02 strip. However, thepolymers generated by C4F8/CO/CHF3 chemistry are flattened with increasing 02 strip duration. The high energy ionbombardment of oxygen ions probably have flattened the rough polymer surface.Keywords: Si02 etching, fluorocarbon polymer, CHF3, CF4, C4F8, C/F ratio, XPS, AFM, 02 strip" @default.
• W1654027706 created "2016-06-24" @default.
• W1654027706 creator A5011185447 @default.
• W1654027706 creator A5015048249 @default.
• W1654027706 creator A5023386862 @default.
• W1654027706 creator A5039591359 @default.
• W1654027706 creator A5045786642 @default.
• W1654027706 creator A5041448905 @default.
• W1654027706 date "1997-08-27" @default.
• W1654027706 modified "2023-09-23" @default.
• W1654027706 title "Characterization of polymer formation during SiO 2 etching with different fluorocarbon gases (CHF 3 , CF 4 , C 4 F 8 )" @default.
• W1654027706 cites W1969728291 @default.
• W1654027706 cites W1981802207 @default.
• W1654027706 cites W1986914212 @default.
• W1654027706 cites W2004622429 @default.
• W1654027706 cites W2009934921 @default.
• W1654027706 cites W2032907123 @default.
• W1654027706 cites W2039505066 @default.
• W1654027706 cites W2044924796 @default.
• W1654027706 cites W2047599532 @default.
• W1654027706 cites W2052507133 @default.
• W1654027706 cites W2062207547 @default.
• W1654027706 cites W2069522803 @default.
• W1654027706 cites W2078636179 @default.
• W1654027706 doi "https://doi.org/10.1117/12.284614" @default.
• W1654027706 hasPublicationYear "1997" @default.
• W1654027706 type Work @default.
• W1654027706 sameAs 1654027706 @default.
• W1654027706 citedByCount "3" @default.
• W1654027706 countsByYear W16540277062021 @default.
• W1654027706 crossrefType "proceedings-article" @default.
• W1654027706 hasAuthorship W1654027706A5011185447 @default.
• W1654027706 hasAuthorship W1654027706A5015048249 @default.
• W1654027706 hasAuthorship W1654027706A5023386862 @default.
• W1654027706 hasAuthorship W1654027706A5039591359 @default.
• W1654027706 hasAuthorship W1654027706A5041448905 @default.
• W1654027706 hasAuthorship W1654027706A5045786642 @default.
• W1654027706 hasConcept C100460472 @default.
• W1654027706 hasConcept C113196181 @default.
• W1654027706 hasConcept C121332964 @default.
• W1654027706 hasConcept C127413603 @default.
• W1654027706 hasConcept C1276947 @default.
• W1654027706 hasConcept C171250308 @default.
• W1654027706 hasConcept C175708663 @default.
• W1654027706 hasConcept C178790620 @default.
• W1654027706 hasConcept C185592680 @default.
• W1654027706 hasConcept C192562407 @default.
• W1654027706 hasConcept C2776875633 @default.
• W1654027706 hasConcept C2779227376 @default.
• W1654027706 hasConcept C2779851234 @default.
• W1654027706 hasConcept C2780841128 @default.
• W1654027706 hasConcept C42360764 @default.
• W1654027706 hasConcept C4839761 @default.
• W1654027706 hasConcept C521977710 @default.
• W1654027706 hasConcept C62520636 @default.
• W1654027706 hasConcept C82706917 @default.
• W1654027706 hasConceptScore W1654027706C100460472 @default.
• W1654027706 hasConceptScore W1654027706C113196181 @default.
• W1654027706 hasConceptScore W1654027706C121332964 @default.
• W1654027706 hasConceptScore W1654027706C127413603 @default.
• W1654027706 hasConceptScore W1654027706C1276947 @default.
• W1654027706 hasConceptScore W1654027706C171250308 @default.
• W1654027706 hasConceptScore W1654027706C175708663 @default.
• W1654027706 hasConceptScore W1654027706C178790620 @default.
• W1654027706 hasConceptScore W1654027706C185592680 @default.
• W1654027706 hasConceptScore W1654027706C192562407 @default.
• W1654027706 hasConceptScore W1654027706C2776875633 @default.
• W1654027706 hasConceptScore W1654027706C2779227376 @default.
• W1654027706 hasConceptScore W1654027706C2779851234 @default.
• W1654027706 hasConceptScore W1654027706C2780841128 @default.
• W1654027706 hasConceptScore W1654027706C42360764 @default.
• W1654027706 hasConceptScore W1654027706C4839761 @default.
• W1654027706 hasConceptScore W1654027706C521977710 @default.
• W1654027706 hasConceptScore W1654027706C62520636 @default.
• W1654027706 hasConceptScore W1654027706C82706917 @default.
• W1654027706 hasLocation W16540277061 @default.
• W1654027706 hasOpenAccess W1654027706 @default.
• W1654027706 hasPrimaryLocation W16540277061 @default.
• W1654027706 hasRelatedWork W1427649230 @default.
• W1654027706 hasRelatedWork W1537853298 @default.
• W1654027706 hasRelatedWork W1574040499 @default.
• W1654027706 hasRelatedWork W1987731082 @default.
• W1654027706 hasRelatedWork W2002170751 @default.
• W1654027706 hasRelatedWork W2005571369 @default.
• W1654027706 hasRelatedWork W2007743986 @default.
• W1654027706 hasRelatedWork W2020091176 @default.
• W1654027706 hasRelatedWork W2027482992 @default.
• W1654027706 hasRelatedWork W2035868307 @default.
• W1654027706 hasRelatedWork W2039505066 @default.
• W1654027706 hasRelatedWork W2074291223 @default.
• W1654027706 hasRelatedWork W2077550558 @default.
• W1654027706 hasRelatedWork W2119216093 @default.
• W1654027706 hasRelatedWork W2332225081 @default.
• W1654027706 hasRelatedWork W2612289805 @default.
• W1654027706 hasRelatedWork W2768379846 @default.
• W1654027706 hasRelatedWork W2921554789 @default.
• W1654027706 hasRelatedWork W3005269639 @default.
• W1654027706 hasRelatedWork W77256321 @default.
• W1654027706 isParatext "false" @default.
• W1654027706 isRetracted "false" @default.

• next