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- W1657277178 abstract "The stability of excess Si around the Si‐oxide/Si interfaces is studied using the first‐principles calculation. The excess Si is suggested to flow into the oxide from the substrate. The excess Si flowing into the oxide becomes SiO interstitials with the O‐vacancy‐like structure, which can be one of the sources of the E’‐centers or the charge traps in the oxide. This Si flow is expected to be rather easier because SiO interstitials can be created via a simple rebonding procedure in the oxide." @default.
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- W1657277178 date "2005-01-01" @default.
- W1657277178 modified "2023-10-01" @default.
- W1657277178 title "First-principles study of excess Si-atom stability around Si-oxide/Si interfaces" @default.
- W1657277178 doi "https://doi.org/10.1063/1.1994149" @default.
- W1657277178 hasPublicationYear "2005" @default.
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