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- W1660208584 abstract "A spherelike granular structure has been observed to appear on the surface of single crystal silicon as a result of a two step reactive ion etching (RIE). Fluorocarbon plasma in RIE mode has been found to create a micromasking of bare silicon. Subsequent application of silicon etch recipe produces a texture with submicron spherical granules. Energy dispersion of x ray and Auger spectra analysis reveal that the suspected deposition or adsorption of etchant and effluent species onto the final surface is insignificant. The technique has a potential for controlling the reflectivity of silicon in specific regions of the spectrum and providing a large throughput." @default.
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- W1660208584 date "1992-11-01" @default.
- W1660208584 modified "2023-09-27" @default.
- W1660208584 title "Granulation of silicon surface through reactive ion etching" @default.
- W1660208584 doi "https://doi.org/10.1116/1.586033" @default.
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