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- W166048138 abstract "Abstract Diamond has been deposited on 1 μm diamond paste scratched silicon and metallic substrates using both oxyacetylene torch and microwave resonant cavity setups. Results clearly evidence the major roles of the surface temperature, and the concentration of both the deposition agent and the etching agent on the nucleation density, the growth rate, the morphology and the nature of the deposit. Once the right composition of the gas determined, the control of the process (uniformity, crystalline orientation, grains dimensions) will only result from an appropriate management of heat transfers resulting, on the one hand, from the reactive flow to the substrate, and on the other hand, from the heating or the cooling system to the substrate. The faster and the more reactive the flow impinging the substrate (oxyacetylene torch), the more important the heat transfer to the surface and on the surface for the controlling of the surface temperature." @default.
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- W166048138 date "1991-01-01" @default.
- W166048138 modified "2023-09-30" @default.
- W166048138 title "Heat Transfers for Diamond Deposition Controlling" @default.
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- W166048138 doi "https://doi.org/10.1016/b978-0-444-89162-4.50083-x" @default.
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