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- W1660647501 abstract "Homoepitaxial growth on off-axis α-SiC (0001) at reduced pressures in a horizontal cold-wall chemical vapor deposition (CVD) system operating at 1500∘C has been investigated. The growth rate was found inversely proportional to the square root of total pressure or the partial pressure of H2, a carrier gas. A model to explain the experimental results is proposed, where the rate-determining process in CVD is competition between Si species and hydrogen atoms for C (carbon) dangling bonds at SiC step edges." @default.
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- W1660647501 date "2004-10-01" @default.
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- W1660647501 title "Rate-determining process in chemical vapor deposition of SiC on off-axis <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML altimg=si18.gif overflow=scroll><mml:mi mathvariant=normal>α</mml:mi></mml:math>-SiC <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML altimg=si19.gif overflow=scroll><mml:mo stretchy=false>(</mml:mo><mml:mn>0</mml:mn><mml:mspace width=0.16em /><mml:mn>0</mml:mn><mml:mspace width=0.16em /><mml:mn>0</mml:mn><mml:mspace width=0.16em /><mml:mn>1…" @default.
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- W1660647501 doi "https://doi.org/10.1016/j.jcrysgro.2004.06.049" @default.
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