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- W1661272007 abstract "The results of X-ray photoelectron spectra (XPS valence band and core levels) measurements for Ge+ implanted SiO2/Si heterostructures are presented. These heterostructures have a 30 nm thick Ge+ ion implanted amorphous SiO2 layer on p-type Si. The chemical-state transformation of the host-matrix composition after Ge+ ion implantation and rapid thermal annealing (RTA) are discussed. The XPS-analysis performed allows to conclude the formation of Ge0 and GeOx clusters within the samples under study. It was established, that the annealing time strongly affects the degree of oxidation states of Ge-atoms." @default.
- W1661272007 created "2016-06-24" @default.
- W1661272007 date "1990-10-01" @default.
- W1661272007 modified "2023-09-26" @default.
- W1661272007 title "Computed tomography for quantitative NDE" @default.
- W1661272007 doi "https://doi.org/10.1016/0308-9126(90)92261-x" @default.
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