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• W1661921605 abstract "The distribution profile of sputtered atoms in the region above a hollow-cathode bore is calculated using a mathematical model and the results are compared with data obtained from atomic absorption spectroscopy studies of the same sputtered metal atom distribution. The smoothing of the distribution function calculated from the model using an experimentally derived instrumental function is detailed. The correlation between the calculated distribution profile and two reconstructed data sets is presented and this is related to experimental studies of the distribution profile. Details of the voltage-current characteristics of the sputtering cells for a number of different hollow-cathode bore geometries are also presented. These and the observed variation in sputtering damage along the length of the various hollow-cathode bores are shown to be related to the discharge properties exhibited by the sputtering cells used in these investigations." @default.
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• W1661921605 date "1998-08-07" @default.
• W1661921605 modified "2023-09-25" @default.
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• W1661921605 doi "https://doi.org/10.1088/0022-3727/31/15/014" @default.
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