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• W1662032712 abstract "Variable-energy positron lifetime spectroscopy was conducted for plasma-deposited thin films of hexamethyldisiloxane (HMDSiO), prepared from pure HMDSiO at different discharge powers and monomer pressures, and from HMDSiO/oxygen mixtures at different oxygen pressures. The lifetime of ortho-positronium (o-Ps) in films deposited from pure HMDSiO increased with the increasing ratio (ISiO/ISiCH) of integrated absorbance of the Si–O–Si band to that of the Si–(CH3)y (y=2,3) band determined by infrared (IR) absorption spectroscopy. The increase in the o-Ps lifetime, indicative of the enlargement of nanometer-scale voids in the film, suggests that the weak interaction between Si–(CH3)y groups and other segments may lead to flexible regions and larger voids. A film deposited from a HMDSiO/O2 mixture had a less stable structure, and no correlation was observed between o-Ps lifetime and ISiO/ISiCH for films deposited from HMDSiO/O2 mixtures." @default.
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• W1662032712 date "2001-01-01" @default.
• W1662032712 modified "2023-10-16" @default.
• W1662032712 title "Nanometer-scale voids in PECVD silicon-oxide films probed by variable-energy positron lifetime spectroscopy:" @default.
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• W1662032712 doi "https://doi.org/10.1016/s0969-806x(00)00400-x" @default.
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