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- W1662474893 abstract "In this letter, we proposed a metal-oxide-high-k-oxide-silicon (MOHOS)-type memory structure using a high-k Yb2O3 charge trapping layer for flash memory applications. When using Fowler-Nordheim for charging and discharging, the high-k Yb2O3 MOHOS-type memories that had been annealed at 800 °C exhibited large threshold voltage shifting (memory window of ∼2.2 V) and excellent data retention (charge loss of ∼6% measured time up to 104 s and at room temperature) because of the higher probability for trapping the charge carrier due to the formation of the Yb-silicate layer and the smooth surface roughness." @default.
- W1662474893 created "2016-06-24" @default.
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- W1662474893 date "2008-11-03" @default.
- W1662474893 modified "2023-09-23" @default.
- W1662474893 title "Metal-oxide-high-k-oxide-silicon memory structure using an Yb2O3 charge trapping layer" @default.
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- W1662474893 doi "https://doi.org/10.1063/1.3021360" @default.
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