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- W1668455105 abstract "First-principles total-energy calculations of the H/Si(001)-2x1 surfaces reveals a dual diffusion process for the Si adatoms: single along the dimer row while pairing up across the row. The calculated diffusion barrier along the dimer row is 1.1 eV, which is, however, too small to account for the hydrogen-induced growth disruption seen by experiments. Instead, we find that the adatom diffusion, in the presence of H, leads to the formation of immobile fourfold-ring Si tetramers which are difficult to break. This could explain the adverse effects of H on Si homoepitaxy." @default.
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- W1668455105 date "2006-12-05" @default.
- W1668455105 modified "2023-10-06" @default.
- W1668455105 title "Self-diffusion on Si(001) mono-hydride surfaces revisited: The role of adatom clustering" @default.
- W1668455105 hasPublicationYear "2006" @default.
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