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- W1668716076 abstract "Si-surface amorphization effects were evaluated to form low-resistance TiSi2 films for sub-quarter-micron CMOS devices. It was found that the C49-to-C54 phase transformation in the TiSi2 film is enhanced by the Si-surface amorphization. Furthermore, the activation energy in this transformation decreased from 4.4 eV to 3.2∼3.9 eV as a result of the Si-surface amorphization." @default.
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- W1668716076 date "1998-01-01" @default.
- W1668716076 modified "2023-09-27" @default.
- W1668716076 title "Si-surface amorphization effects for C49-to-C54 phase transformation in" @default.
- W1668716076 doi "https://doi.org/10.1063/1.54668" @default.
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