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- W1670143238 abstract "We have studied photoelectrodes of the type Pt/silicon oxide/n‐Si in both aqueous iodine and bromine solutions as a function of the oxidation time allowed for the growth of the silicon oxide. The Pt thicknesses were always 20Å, and surface studies showed a surface coverage by the metal films of about 90%. The oxidations were carried out for between 1 and 30 min at 510°C in 1 atm of oxygen. The performance parameters were investigated using C‐V and I‐V measurements. All samples showed tunnel coefficients of electrons through the oxide of approximately 0.1. Short oxidation times were found to result in Fermi level pinning, ascribed to the presence of interface states. Oxidation for 30 min was found to be sufficient to anneal out the interface states and unpin the Fermi level, but caused undesirable impurity recombination centers to diffuse into the silicon, thereby limiting the achievable efficiency to 8%." @default.
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- W1670143238 date "1987-04-01" @default.
- W1670143238 modified "2023-09-27" @default.
- W1670143238 title "Photoelectrochemical Cells of the Electrolyte‐Metal‐Insulator‐Semiconductor (EMIS) Configuration: III . Aspects Relating to Thermal Oxide Growth in the Pt/Silicon Oxide/n‐Si System" @default.
- W1670143238 doi "https://doi.org/10.1149/1.2100590" @default.
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