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• W1678643603 abstract "In this work, the temperature accelerated NBTI effect is modeled by a universal model. The investigation of the threshold voltage shift over a wide temperature range reveals distinct degradation mechanisms under low and high temperatures, which is supposed due to the influence of temperature to the Si-H bond activation energy and H 2 diffusivity. The active energy of the interface-state generation and the hole-trapping/detrapping time constant are found as monotonie functions of temperature. Universality of the proposed NBTI temperature model is also verified using SiON gate dielectric p-MOSFET with different nitrogen densities. The NBTI recovery characteristics under conditions of constant and variable temperature are accurate described." @default.
• W1678643603 created "2016-06-24" @default.
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• W1678643603 date "2015-06-01" @default.
• W1678643603 modified "2023-09-23" @default.
• W1678643603 title "Accurate description of temperature accelerated NBTI effect using the universal prediction model" @default.
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• W1678643603 doi "https://doi.org/10.1109/edssc.2015.7285059" @default.
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