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- W16969969 abstract "In this paper, we present the molecular beam epitaxy of very high p-type doping levels into GaAs using beryllium as a dopant. Very low resistivity, multilayer-compatible material is achieved with doping levels as high as 2 × 1020cm-3. We study the beryllium incorporation during growth, and discuss, based on experimental results, how such layers can significantly improve the speed of heterojunction bipolar transistors." @default.
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- W16969969 date "1988-01-01" @default.
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- W16969969 title "Molecular Beam Epitaxy of Ga0.99Be0.01As for very high Speed Heterojunction Bipolar Transistors" @default.
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- W16969969 doi "https://doi.org/10.1007/978-1-4684-5553-3_3" @default.
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