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• W1744782995 endingPage "43" @default.
• W1744782995 startingPage "39" @default.
• W1744782995 abstract "Anatase TiO 2 thin films are deposited on K9 glass samples at different substrate temperatures by radio frequency magnetron sputtering. N ion implantation is performed in the as-deposited TiO 2 thin films at ion fluences of 5 × 10 16 , 1 × 10 17 , and 5 × 10 17 ions/cm 2 . X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy (XPS), and UV–visible spectrophotometer are used to characterize the films. With increasing N ion fluences, the absorption edges of anatase TiO 2 films shift to longer wavelengths and the absorbance increases in the visible light region. XPS results show that the red shift of TiO 2 films is due to the formation of N–Ti–O compounds. As a result, photoactivity is enhanced with increasing N ion fluence." @default.
• W1744782995 created "2016-06-24" @default.
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• W1744782995 date "2012-01-01" @default.
• W1744782995 modified "2023-09-23" @default.
• W1744782995 title "Optical properties of anatase TiO2 films modified by N ion implantation" @default.
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• W1744782995 doi "https://doi.org/10.1139/p11-136" @default.
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