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- W1745278512 abstract "A detailed structural analysis of ZrxNi100-x thin film metallic glasses (TFMGs) has been performed for various film compositions. TFMGs have received more and more attention these last years owing to their outstanding mechanical properties among which a fracture strength close to the theoretical limit, high hardness and elastic deformation [1]. Moreover, they exhibit fascinating functional properties which span in the electric, magnetic as well as corrosion and wear resistance fields [2]. Despite these promising properties, less attention has been paid to the atomic structure analysis of TFMGs, while many investigations have been conducted on bulk binary amorphous alloys [3]. Here, we systematically investigate the change in atomic structure for different ZrxNi100-x TFMGs compositions (42 ≤ % at. Zr ≤ 85) deposited by DC magnetron sputtering. An original method for designing a composite sputtering target has been used in which pure grade Ni slices are inserted in a Zr matrix, allowing a fine tuning of the film composition. The effects of this new target geometry on the film growth rate, thickness profile as well as film stoichiometry have been thoroughly investigated. The film structural analysis has been carried out by x-ray diffraction (XRD) and transmission electron microscopy (TEM) providing in-depth information about the evolution of the atomic structure for different film compositions, especially highlighting crystallites growth phenomena for Zr rich specimens. Furthermore, the compositional-induced changes in film elastic properties have been evaluated by Brillouin spectroscopy. Based on these results, we present an effective model that succeeds in describing the structural evolution of ZrxNi100-x TFMGs involving different compositions." @default.
- W1745278512 created "2016-06-24" @default.
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- W1745278512 date "2013-01-01" @default.
- W1745278512 modified "2023-09-22" @default.
- W1745278512 title "Compositional-induced structural change of ZrNi thin film metallic glasses deposited by magnetron sputtering" @default.
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