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- W1755131071 abstract "The voltage distribution at the n-WSe{sub 2} and n-MoSe{sub 2}/electrolyte interface is obtained from electroreflection and capacitance measurements. Variations in the electroreflection signal intensity with electrode potential are used as a direct probe to locate the band position as a function of potential. Capacitance measurements are consistent with and complement the electroreflection results. As expected, a variety of Fe{sup 3+/2+} based mid-gap redox couples have no significant effect on the voltage distribution across either dichalcogenide/electrolyte interface. In the presence of the strongly oxidizing cerium redox couple, the authors observed flatband shifts/double-layer charging, and conclude the Ce{sup 4+} adsorption rather than hole infection is the cause. There is a common threshold of 0.4 V above either dichalcogenide's flat-band potential before the double layer beings to charge. Then, for more positive biases, it is the double layer that charges while the space charge voltage remains relatively unaffected. Finally, above about 0.7 and 1.1 V respectively, double-layer charging ceases, and the applied voltage again appears predominantly across the space-charge region. In this paper, the authors estimate that Ce{sup 4+} adsorption saturates with a coverage on the order of 0.1 monolayer." @default.
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- W1755131071 date "1992-01-01" @default.
- W1755131071 modified "2023-09-27" @default.
- W1755131071 title "Voltage Distribution at the n ‐ WSe2 and n ‐ MoSe2 Electrolyte Interface" @default.
- W1755131071 doi "https://doi.org/10.1149/1.2069164" @default.
- W1755131071 hasPublicationYear "1992" @default.
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