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- W175923245 abstract "Ion scattering and channeling techniques were used to study production of disorder and randomization of SiC by implantation of Cr/sup +/ and N/sup +/ at doses of up to 3 x 10/sup 16/ /cm/sup 2/ for Cr/sup +/ and 8 x 10/sup 16/ /cm/sup 2/ for N/sup +/. Experiments were designed so that the calculated damage energy profiles would be well matched for the two ion species. The results were compared for the degree of effectiveness of Cr/sup +/ and N/sup +/ in producing disorder. At higher doses, Cr/sup +/ was much more effective than N/sup +/ for a given damage energy using the same calculational method for Cr/sup +/ as for N/sup +/. In correlated studies of swelling, both species had about the same effectiveness in producing swelling." @default.
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- W175923245 date "1982-01-01" @default.
- W175923245 modified "2023-09-27" @default.
- W175923245 title "Structural alterations in SiC as a result of Cr/sup +/ and N/sup +/ implantation" @default.
- W175923245 hasPublicationYear "1982" @default.
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