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- W1781931310 abstract "Implantation of GaN is important for selective doping and isolation applications. This paper reports on the extreme difficulty in removing ion implantation damage from Si-implanted GaN during annealing up to 1100/spl deg/C." @default.
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- W1781931310 date "2002-12-24" @default.
- W1781931310 modified "2023-09-27" @default.
- W1781931310 title "Ion implantation into gallium nitride" @default.
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- W1781931310 doi "https://doi.org/10.1109/commad.1996.610149" @default.
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