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- W1799307093 abstract "The use of multiply charge ion beams is common practice for producing high energy beams for ion implantation. In the use of these beams an understanding of the mechanisms available for energy contamination to take place, and their effect on the implant profile is required. This paper demonstrates a technique of modeling this potential contamination using TRIM and applying the profile obtained to a SIMS profile." @default.
- W1799307093 created "2016-06-24" @default.
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- W1799307093 date "2002-12-24" @default.
- W1799307093 modified "2023-09-25" @default.
- W1799307093 title "Characterizing energy contamination mechanisms in multiply charged ion beams" @default.
- W1799307093 doi "https://doi.org/10.1109/iit.1996.586144" @default.
- W1799307093 hasPublicationYear "2002" @default.
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