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- W1801545834 abstract "A facility for submicron VLSI chip manufacturing has been designed with the concept of the SMIF (standard mechanical interface) optimized cleanroom system. This facility involves an 80000 square foot cleanroom with a class 1000 ambient nonlaminar air flow, with equipment isolated in subclass 1 islands, each with SMIF interfaces. Significant reduction in the clean air requirements resulted in a reduction in air handling requirements, thereby leading to reduced construction and operating costs. Isolated subclass 1 islands provide assured cleanliness even in the event of external contamination disturbances. In effect, class 1 is assured immediately above the exposed wafers in such a facility as compared to at-the-ceiling as in a conventional cleanroom. Facility design concepts and estimates of cost savings in facility construction and operation are presented. >" @default.
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- W1801545834 date "2003-01-13" @default.
- W1801545834 modified "2023-09-27" @default.
- W1801545834 title "Design of a submicron facility with SMIF optimized cleanroom system" @default.
- W1801545834 doi "https://doi.org/10.1109/ismss.1989.77250" @default.
- W1801545834 hasPublicationYear "2003" @default.
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