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- W1805300327 abstract "This paper describes a precise phase-controlled grating delineation method for distributed-feedback (DFB) laser diodes (LDs). This method, called weighted-dose allocation variable-pitch electron-beam lithography (WAVE), enables us to fabricate gratings with different pitches while suppressing the stitching errors between the exposure fields, thus producing a precise pitch-controlled grating as well as a flexible grating with a continuously chirped structure. The small stitching error and the accuracy of the pitch and phase were evaluated by using a moire pattern microscope. The WAVE method is a powerful tool for fabricating sophisticated optical grating devices such as precise wavelength controlled LDs with specific characteristics for use in WDM network systems." @default.
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- W1805300327 date "2002-11-27" @default.
- W1805300327 modified "2023-10-17" @default.
- W1805300327 title "Precise phase-controlled flexible grating delineated by weighted-dose electron beam lithography" @default.
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- W1805300327 doi "https://doi.org/10.1109/iciprm.1998.712748" @default.
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