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• W1813480557 abstract "The aim of this work was to study field emission from carbon and silicon-carbon films prepared by Very High Frequency Chemical Vapour Deposition (VHF CVD). The films were prepared by capacitive discharge at a frequency f=58 MHz from argon-methane, hexane, hexane-hydrogen and hexane-silane-hydrogen mixtures on substrates of silicon, quartz and titanium-coated ceramics at temperatures of 200-250/spl deg/C. The films were characterised by AFM, Raman spectroscopy and conductivity measurements. Field electron emission was measured for an anode-to-cathode distance of 40 micron. Scanning secondary electron emission microscopy (SSEEM) measurements over sample area were performed before and after field emission measurements." @default.
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• W1813480557 date "2002-11-27" @default.
• W1813480557 modified "2023-09-27" @default.
• W1813480557 title "Field emission from amorphous carbon and silicon-carbon films, prepared by VHF CVD" @default.
• W1813480557 doi "https://doi.org/10.1109/ivmc.1998.728748" @default.
• W1813480557 hasPublicationYear "2002" @default.
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