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- W1831167341 abstract "In this paper, we compare the 3D VQM expressions obtained for the capacitive energy of the oxide region and the depletion region with those for a device with infinitely large gate. The 3D quantum mechanical effect of the fringe field on the energy is then extracted as a correction factor to the capacitance for each region." @default.
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- W1831167341 date "2004-05-06" @default.
- W1831167341 modified "2023-09-23" @default.
- W1831167341 title "Fringe field and quantum mechanical effects on capacitance characteristics of sub-0.1 micron MOS devices" @default.
- W1831167341 cites W1965199352 @default.
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- W1831167341 doi "https://doi.org/10.1109/drc.2003.1226868" @default.
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