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- W1831202623 endingPage "333" @default.
- W1831202623 startingPage "333" @default.
- W1831202623 abstract "Objectives: To associate work in the semiconductor industry, including silicon wafer fabrication, with cancer risks or mortality and other adverse health effects, the operation of wafer fabrication should initially be understood. A detailed study on the fabrication operation allows retrospective exposure to be assessed and wafer fabrication workers to be classified into similar exposure groups. Therefore, the objective of this study was to comprehensively review silicon wafer fabrication operations and related hazardous materials and agents. Methods: The literatures related to semiconductor industry processes were reviewed from an occupational health viewpoint based on wafer manufacturing, wafer fabrication and packaging. The focus was especially related to the hazardous materials used in wafer fabrication industries. Results: During the fabrication of silicon wafers, many toxic chemicals, a strong electric field and hazardous equipment are used. The process allows the integration of a three-dimensional array of electric circuits onto a silicon wafer substrate. Wafers are sliced from single crystal silicon and subject to a series of steps during the fabrication process, which alternatively adds and then selectively removes materials in layers from the surface of the wafer to create different parts of the completed integrated circuit. There are four major steps in this process; patterning, junction formation, thin film and metallization. Conclusions: In order to associate exposure to the hazard agents generated during wafer fabrication operations with adverse health effects the details of the operation should be completely studied, which will be helpful in both exposure assessments and epidemiological studies." @default.
- W1831202623 created "2016-06-24" @default.
- W1831202623 creator A5005320326 @default.
- W1831202623 creator A5008225530 @default.
- W1831202623 creator A5022513576 @default.
- W1831202623 creator A5023082582 @default.
- W1831202623 creator A5027843038 @default.
- W1831202623 creator A5044689089 @default.
- W1831202623 creator A5052473072 @default.
- W1831202623 creator A5078278683 @default.
- W1831202623 date "2011-01-01" @default.
- W1831202623 modified "2023-09-26" @default.
- W1831202623 title "Review on Potential Risk Factors in Wafer Fabrication Process of Semiconductor Industry" @default.
- W1831202623 doi "https://doi.org/10.35371/kjoem.2011.23.3.333" @default.
- W1831202623 hasPublicationYear "2011" @default.
- W1831202623 type Work @default.
- W1831202623 sameAs 1831202623 @default.
- W1831202623 citedByCount "10" @default.
- W1831202623 countsByYear W18312026232012 @default.
- W1831202623 countsByYear W18312026232013 @default.
- W1831202623 countsByYear W18312026232015 @default.
- W1831202623 countsByYear W18312026232016 @default.
- W1831202623 countsByYear W18312026232018 @default.
- W1831202623 countsByYear W18312026232021 @default.
- W1831202623 countsByYear W18312026232022 @default.
- W1831202623 countsByYear W18312026232023 @default.
- W1831202623 crossrefType "journal-article" @default.
- W1831202623 hasAuthorship W1831202623A5005320326 @default.
- W1831202623 hasAuthorship W1831202623A5008225530 @default.
- W1831202623 hasAuthorship W1831202623A5022513576 @default.
- W1831202623 hasAuthorship W1831202623A5023082582 @default.
- W1831202623 hasAuthorship W1831202623A5027843038 @default.
- W1831202623 hasAuthorship W1831202623A5044689089 @default.
- W1831202623 hasAuthorship W1831202623A5052473072 @default.
- W1831202623 hasAuthorship W1831202623A5078278683 @default.
- W1831202623 hasConcept C111919701 @default.
- W1831202623 hasConcept C112930515 @default.
- W1831202623 hasConcept C117671659 @default.
- W1831202623 hasConcept C127413603 @default.
- W1831202623 hasConcept C136525101 @default.
- W1831202623 hasConcept C142724271 @default.
- W1831202623 hasConcept C144133560 @default.
- W1831202623 hasConcept C160671074 @default.
- W1831202623 hasConcept C171250308 @default.
- W1831202623 hasConcept C192562407 @default.
- W1831202623 hasConcept C204787440 @default.
- W1831202623 hasConcept C2987888538 @default.
- W1831202623 hasConcept C35750839 @default.
- W1831202623 hasConcept C41008148 @default.
- W1831202623 hasConcept C66018809 @default.
- W1831202623 hasConcept C71924100 @default.
- W1831202623 hasConcept C98045186 @default.
- W1831202623 hasConceptScore W1831202623C111919701 @default.
- W1831202623 hasConceptScore W1831202623C112930515 @default.
- W1831202623 hasConceptScore W1831202623C117671659 @default.
- W1831202623 hasConceptScore W1831202623C127413603 @default.
- W1831202623 hasConceptScore W1831202623C136525101 @default.
- W1831202623 hasConceptScore W1831202623C142724271 @default.
- W1831202623 hasConceptScore W1831202623C144133560 @default.
- W1831202623 hasConceptScore W1831202623C160671074 @default.
- W1831202623 hasConceptScore W1831202623C171250308 @default.
- W1831202623 hasConceptScore W1831202623C192562407 @default.
- W1831202623 hasConceptScore W1831202623C204787440 @default.
- W1831202623 hasConceptScore W1831202623C2987888538 @default.
- W1831202623 hasConceptScore W1831202623C35750839 @default.
- W1831202623 hasConceptScore W1831202623C41008148 @default.
- W1831202623 hasConceptScore W1831202623C66018809 @default.
- W1831202623 hasConceptScore W1831202623C71924100 @default.
- W1831202623 hasConceptScore W1831202623C98045186 @default.
- W1831202623 hasIssue "3" @default.
- W1831202623 hasLocation W18312026231 @default.
- W1831202623 hasOpenAccess W1831202623 @default.
- W1831202623 hasPrimaryLocation W18312026231 @default.
- W1831202623 hasRelatedWork W1535064426 @default.
- W1831202623 hasRelatedWork W2037225674 @default.
- W1831202623 hasRelatedWork W2045750999 @default.
- W1831202623 hasRelatedWork W2098136697 @default.
- W1831202623 hasRelatedWork W2121870611 @default.
- W1831202623 hasRelatedWork W2139950004 @default.
- W1831202623 hasRelatedWork W2237555391 @default.
- W1831202623 hasRelatedWork W2373255010 @default.
- W1831202623 hasRelatedWork W2620364289 @default.
- W1831202623 hasRelatedWork W4252157062 @default.
- W1831202623 hasVolume "23" @default.
- W1831202623 isParatext "false" @default.
- W1831202623 isRetracted "false" @default.
- W1831202623 magId "1831202623" @default.
- W1831202623 workType "article" @default.