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- W18371557 abstract "Diamond films deposited on silicon wafers have been evaluated by a variety of analytical and mechanical procedures in preparation for tribological studies of these films. For in situ wear studies of diamond films, analysis techniques must be developed that do not damage the films. An ion sputter-cleaning procedure has been found (200 eV acceleration energy) which allows reduction of surface contaminants and a cleaning up'' of the sp{sup 3} bonding. Preliminary tribological pin-on-plate studies have been completed for a hardened 440C stainless steel pin sliding on the diamond films in laboratory air." @default.
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- W18371557 date "1989-01-01" @default.
- W18371557 modified "2023-09-27" @default.
- W18371557 title "Characterization and in situ testing of diamond films" @default.
- W18371557 hasPublicationYear "1989" @default.
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