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- W1842899534 abstract "EUV lithography is the most promising candidate for the fabrication of devices with feature sizes of 70 nm and below. Since October, 1998, ASET has been working on the development of the basic technologies of EUV lithography in cooperation with Prof. H.Kinoshita of the Himeji Institute of Technology. These technologies can be broken down into three categories: exposure system, multilayer mask, and resist process." @default.
- W1842899534 created "2016-06-24" @default.
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- W1842899534 date "2002-11-07" @default.
- W1842899534 modified "2023-09-27" @default.
- W1842899534 title "Recent activities in the development of EUV lithography at ASET" @default.
- W1842899534 doi "https://doi.org/10.1109/imnc.2000.872749" @default.
- W1842899534 hasPublicationYear "2002" @default.
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