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- W1851470523 abstract "In this paper, we report pattern transfer characteristic of the imprint lithography by employing a triple-layer-resist method. In addition, fabrication of MOSFETs having the gate length down to 100 nm is demonstrated. Gate oxide integrity is also tested in order to investigate mechanical damage of the imprint stress on devices." @default.
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- W1851470523 date "2002-11-07" @default.
- W1851470523 modified "2023-09-26" @default.
- W1851470523 title "Imprint lithography using triple-layer-resist and its application to MOSFET fabrication" @default.
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- W1851470523 doi "https://doi.org/10.1109/imnc.2000.872730" @default.
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