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• W1855096905 abstract "Spatial distributions of various plasma parameters such as plasma density, electron temperature, and radical density in an inductively coupled plasma (ICP) and a magnetized inductively coupled plasma (M-ICP) were investigated and compared. Electron temperature in between the rf window and the substrate holder of M-ICP was higher than that of ICP, whereas the one just above the substrate holder of M-ICP was similar to that of ICP when a weak (&lt;8 G) magnetic field was employed. As a result, radical densities in M-ICP were higher than those in ICP and the etch rate of oxide in M-ICP was faster than that in ICP without severe electron charging in 90 nm high aspect ratio contact hole etch." @default.
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• W1855096905 date "2015-06-23" @default.
• W1855096905 modified "2023-10-16" @default.
• W1855096905 title "Study on spatial distribution of plasma parameters in a magnetized inductively coupled plasma" @default.
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• W1855096905 doi "https://doi.org/10.1116/1.4923027" @default.
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