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- W1878272359 abstract "An optimized CH4+H2 inductively coupled-plasma reactive-ion-etching process for fabrication of high quality nanophotonic InGaAsP/InP waveguide device has been developed. Important parameters that influence e-beam lithography and etching have been optimized for a simple metal lift-off masked process. Smooth sidewalls with low grass content has been demonstrated for >3 μm etch depths in InGaAsP/InP using an Al lift-off etch mask." @default.
- W1878272359 created "2016-06-24" @default.
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- W1878272359 date "2015-08-26" @default.
- W1878272359 modified "2023-10-16" @default.
- W1878272359 title "Fabrication of low grass, smooth sidewall InGaAsP by methane–hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography" @default.
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- W1878272359 doi "https://doi.org/10.1116/1.4929437" @default.
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