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• W1901782012 abstract "An ethane (C/sub 2/H/sub 2/) reactive ion etching (RIE) technique that offers smooth-etched morphology, high controllability of depth, and anisotropic geometries for forming a nonuniform-depth grating on an InP substrate is discussed. The fabrication of a lambda /4-shifted multiple quantum well (MQW) distributed feedback (DFB) laser with a 900 mu m cavity and a nonuniform-depth grating is described. It is shown that the larger threshold gain difference predicted by theory is obtained despite strong hole-burning. >" @default.
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• W1901782012 date "2002-12-09" @default.
• W1901782012 modified "2023-09-22" @default.
• W1901782012 title "Reactively ion etched nonuniform-depth grating for advanced DFB lasers" @default.
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• W1901782012 doi "https://doi.org/10.1109/iciprm.1991.147347" @default.
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