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- W1907788504 abstract "A modified MOST (metal-oxide-semiconductor transistor) physical structure that gives higher current and higher transconductance for the same V/sub T/ is suggested. For an n-channel MOST, the suggested structure uses a floating buried n/sup +/ layer below the gate area at a distance approximately equal to the maximum depletion layer width below the silicon-oxide interface. Computer simulation using PISCES-IIB is used to characterize the suggested structure. Results obtained verified the anticipated increase in drain current and transconductance. >" @default.
- W1907788504 created "2016-06-24" @default.
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- W1907788504 date "2003-01-02" @default.
- W1907788504 modified "2023-09-25" @default.
- W1907788504 title "Simulation results of a modified MOST structure" @default.
- W1907788504 cites W2050409976 @default.
- W1907788504 doi "https://doi.org/10.1109/mwscas.1992.271317" @default.
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