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- W1908576420 abstract "Epitaxial ZrB 2 thin films were deposited at a temperature of 900 °C on 4H‐SiC(0001) and Si(111) substrates by magnetron sputtering from a ZrB 2 source at a high rate ∼80 nm/min. The films were analyzed by thin film X‐ray diffraction including pole figure measurements and reciprocal space mapping as well as high‐resolution electron microscopy." @default.
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- W1908576420 date "2013-12-02" @default.
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- W1908576420 title "Magnetron sputtering of epitaxial ZrB<sub>2</sub> thin films on 4H-SiC(0001) and Si(111)" @default.
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- W1908576420 doi "https://doi.org/10.1002/pssa.201330308" @default.
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