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• W1912305087 abstract "In this work, we investigate workfunction (WK) fluctuation of gate-all-around Si nanowire MOS devices by solving a sets of 2D Schrodinger-Poisson equations. We discuss characteristic fluctuation in view of randomly interactive quantum confinement with subbands and wavefunctions. The influences of metal-grain size and channel width on the random WK-induced characteristic fluctuation are studied; additionally, the random positions of metal grain are discussed. The WK of metal grain in the corner of square-shaped channel possesses greater impact on characteristic fluctuation because of enhanced corner effect. Devices with a large channel width and small nanosized metal grains suffer from relatively smaller percentage of fluctuation." @default.
• W1912305087 created "2016-06-24" @default.
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• W1912305087 date "2015-09-01" @default.
• W1912305087 modified "2023-09-22" @default.
• W1912305087 title "Nanosized-metal-grain-induced characteristic fluctuation in gate-all-around si nanowire metal-oxide-semiconductor devices" @default.
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• W1912305087 doi "https://doi.org/10.1109/iwce.2015.7301971" @default.
• W1912305087 hasPublicationYear "2015" @default.
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