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- W1918502014 abstract "Devices fabricated at the scaling limits of conventional technology must either contend with quantum-mechanical tunneling as a parasitic effect or incorporate tunneling into the device function. Taking the latter approach, the phenomenon of resonant tunneling between epitaxially-grown double-barrier heterostructures shows significant promise for extending integrated circuit performance both before and beyond the post-shrink era. Recent progress in this technology is reviewed." @default.
- W1918502014 created "2016-06-24" @default.
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- W1918502014 date "2002-11-19" @default.
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- W1918502014 title "Resonant tunneling and quantum integrated circuits" @default.
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- W1918502014 doi "https://doi.org/10.1109/cornel.1995.482540" @default.
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