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- W1936203431 abstract "The effects of annealing ambients (Ar, N/sub 2/, and O/sub 2/) on the dielectric strength of silicon dioxide with a CVD WSi/sub 2/ polycide gate were investigated. The degradation of the dielectric strength of the gate oxide and Si precipitation at the edge of the WSi/sub 2/ polycide gate were observed only for devices annealed in Ar ambient. The dielectric strength of the gate oxide decreased with higher annealing temperature, longer annealing time, and larger composition ration (Si/W) of the WSi/sub 2/ film. A mechanism for the effects is proposed. >" @default.
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- W1936203431 date "2003-01-06" @default.
- W1936203431 modified "2023-09-24" @default.
- W1936203431 title "The effects of annealing ambients on dielectric strength of gate oxides with tungsten polycide gate" @default.
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- W1936203431 doi "https://doi.org/10.1109/vmic.1988.14192" @default.
- W1936203431 hasPublicationYear "2003" @default.
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