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- W1949776966 abstract "55 V high-side RESURF LDMOS has been integrated successfully in 0.35 /spl mu/m smart power technology by carefully arranging the lateral doping profile. This device has Rds.on/spl times/area of 0.55 m/spl Omega/.cm/sup 2/ with excellent safe operating area. With proper device terminal biasing scheme, this device can also be used as an isolated device. Techniques and issues related to the isolation is considered and discussed." @default.
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- W1949776966 date "2002-11-13" @default.
- W1949776966 modified "2023-10-16" @default.
- W1949776966 title "Implementation of high-side, high-voltage RESURF LDMOS in a sub-half micron smart power technology" @default.
- W1949776966 doi "https://doi.org/10.1109/ispsd.2001.934639" @default.
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