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- W1949880156 abstract "Nanoporous methylsilsesquioxane (MSSQ) films are a leading candidate for low dielectric constant (k) materials for microelectronic interconnects. Mechanical strength reduces rapidly with lower k (increasing porosity) however, and there is a lack of techniques to characterize these properties in the k /spl les/ 2 range. This work reports surface acoustic wave spectroscopy characterization of density/porosity and Young's modulus values of a range of methylsilsesquioxane films from different manufacturers. We show that the results are validated by independent measurements and that nanoindentation measurements consistently overestimate stiffness." @default.
- W1949880156 created "2016-06-24" @default.
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- W1949880156 date "2003-06-25" @default.
- W1949880156 modified "2023-10-14" @default.
- W1949880156 title "Nondestructive stiffness and density characterization of porous low-k films by surface acoustic wave spectroscopy" @default.
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- W1949880156 doi "https://doi.org/10.1109/iitc.2002.1014943" @default.
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