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• W1963564810 abstract "This paper presents the entire fabrication and processing steps necessary for wafer scale monolithic integration of series interconnected GaSb devices grown on semi-insulating GaAs substrates. A device array has been fabricated on complete 50 mm (2 inch) diameter wafer using standard photolithography, wet chemical selective etching, dielectric deposition and single-sided metallization. For proof of concept of the wafer-scale feasibility of this process, six large-area series interconnected GaSb p–n junction thermophotovoltaic cells with each cell consisting of 24 small-area devices have been fabricated and characterized for its electrical connectivity. The fabrication process presented in this paper can be used for optoelectronic and electronic device technologies based on GaSb and related antimonide based compound semiconductors." @default.
• W1963564810 created "2016-06-24" @default.
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• W1963564810 date "2013-04-30" @default.
• W1963564810 modified "2023-09-30" @default.
• W1963564810 title "Wafer-scale processing technology for monolithically integrated GaSb thermophotovoltaic device array on semi-insulating GaAs substrate" @default.
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• W1963564810 doi "https://doi.org/10.1088/0268-1242/28/6/065002" @default.
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