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- W1963572983 abstract "A reduction in the effective barrier height in a PtSi-p-Si Schottky diode was achieved using low energy ion implantation to introduce a shallow p+ layer on a p-Si substrate. After the Schottky diode had been implanted with 3 keV11B+ ions to a dose of 4 × 1012 ions cm-2, the barrier height was observed to decrease from 0.26 to 0.16 eV. The reduction in barrier height correlated well with the boron concentration found at or near the PtSiSi interface." @default.
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- W1963572983 date "1982-07-01" @default.
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- W1963572983 title "Reduction in the effective barrier height in PtSi-p-Si Schottky diodes by using low energy ion implantation" @default.
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- W1963572983 doi "https://doi.org/10.1016/0040-6090(82)90146-8" @default.
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