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- W1963586013 abstract "The SiN membranes were deposited by using high temperature LPCVD system. The SiN films deposited over 1000 degree(s)C showed the suitable properties for X-ray mask, such as well- controlled tensile stress of 5 X 10<SUP>7</SUP> Pa, high optical transmittance over 95% and low impurity concentrations. The high optical transmittance of the SiN films deposited over 1000 degree(s)C was related to the high N/Si. The X-ray masks fabricated by using the SiN membranes deposited at 1000 degree(s)C showed the high optical transmittance of about 92% and X-ray durability. The pattern position displacement induced by SR irradiation was simulated using FEM calculation with qualitative agreement." @default.
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- W1963586013 date "1994-11-03" @default.
- W1963586013 modified "2023-10-16" @default.
- W1963586013 title "Fabrication of reliable x-ray mask using high-temperature deposited SiN membrane by low-pressure chemical vapor deposition system" @default.
- W1963586013 doi "https://doi.org/10.1117/12.191942" @default.
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