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- W1963672236 abstract "Si (100) wafers were treated by a dry processing procedure to produce a clean thin surface oxide. The Angle-Dependent XPS (ADXPS) spectra of these surfaces show the formation of a uniform oxide. The high resolution data from the Si 2p region collected with monochromatic X-rays suggested multiple Si chemical environments. Synthetic curve-fitting of the Si 2p region confirmed the presence of Si metal, silicon dioxide and suboxides. In order to fit the Si metal region accurately it was necessary to include a second spin doublet. This additional spin doublet is mainly attributed to a silicon fluoride species. Target factor analysis applied to the ADXPS spectra of the elemental silicon region collected at six angles extracted the spectra and concentrations of two Si species. Both factors were observed as spin doublets and were attributed to silicon in elemental and fluoride environments." @default.
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- W1963672236 date "1990-01-01" @default.
- W1963672236 modified "2023-09-24" @default.
- W1963672236 title "Factor analysis of angle-dependent XPS Si 2p spectra from dry processed Si wafers" @default.
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- W1963672236 doi "https://doi.org/10.1016/0368-2048(90)85026-6" @default.
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