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- W1963704001 abstract "Epitaxial layers of GazIn1−zAs have been grown in a horizontal, low pressure metalorganic chemical vapour deposition reactor, using a mixing manifold of radial symmetry. The effect of the inlet configuration of the reactant gases on the compositional uniformity of the layers has been investigated by photoluminescence spectroscopy. It was found that incomplete gas phase mixing of the reactants resulted in poor uniformity of the grown layers. By incorporating a mixing device in the gas line, which imparted a rotational component to the gas flow, epitaxial layer uniformities were markedly improved." @default.
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- W1963704001 date "1987-08-01" @default.
- W1963704001 modified "2023-10-18" @default.
- W1963704001 title "A gas mixing device for MOCVD" @default.
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- W1963704001 doi "https://doi.org/10.1016/0022-0248(87)90129-1" @default.
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