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- W1963778875 abstract "A semi-in-lens electron beam (EB) optical system improves the beam resolution. However, the eddy current is induced in the target and deviates the beam position when the stage is moving continuously. We calculated the eddy current distribution by approximating the magnetic field on the target to a Gaussian distribution. In the mask-scan EB column1 the maximum value and the dispersion of the magnetic field on the target are 0.01 T and 30 mm, respectively. The beam shift due to the eddy current flowing in the Cr film on a reticle is 1.5 X 10-11 m at the stage speed of 0.1 m/s. Therefore, the eddy current does not degrade the positional accuracy." @default.
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- W1963778875 date "2001-01-22" @default.
- W1963778875 modified "2023-10-18" @default.
- W1963778875 title "Eddy current evaluation for a high-resolution EB system" @default.
- W1963778875 doi "https://doi.org/10.1117/12.410723" @default.
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