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- W1963949804 abstract "The I-V characteristics of metal oxide semiconductors has long been a subject of research by many scientists in the field of microelectronics. It is generally accepted that the current conduction in the thin gate oxide is due to the Fowler-Nordheim tunneling emission. However, there is quite a variation in the electrical properties and the Fowler-Nordheim tunneling parameters reported by researchers. This is partially due to the presence of oxide charges which affects the I-V characteristics of the gate oxide and thereby the extracted parameters. The current conduction in the thin gate oxide is complicated; different mechanisms may dominate at different voltage regions. In this study, multiple regression analysis is utilized to determine the basic conduction process and to clarify the discrepancies in the literature." @default.
- W1963949804 created "2016-06-24" @default.
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- W1963949804 date "1994-01-01" @default.
- W1963949804 modified "2023-09-28" @default.
- W1963949804 title "Analyzing the I-V characteristics of thin gate oxides using multiple regression" @default.
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- W1963949804 doi "https://doi.org/10.1109/southc.1994.498091" @default.
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