Matches in SemOpenAlex for { <https://semopenalex.org/work/W1964092015> ?p ?o ?g. }
Showing items 1 to 100 of
100
with 100 items per page.
- W1964092015 endingPage "343" @default.
- W1964092015 startingPage "335" @default.
- W1964092015 abstract "Abstract A focused-ion-beam (FIB) machine is a versatile tool used extensively in the integrated circuit (IC) industry for conducting failure analysis, prototype fabrication, and device repair. Lithography can also be performed using FIB for direct patterning of photoresists without using a mask. The FIB technique has several advantages over other maskless processes, such as direct-write e-beam lithography; ion-beam patterning of the photoresist offers higher resist sensitivity and lesser backscattering/proximity effects than the e-beam patterning. In this paper, we investigated a new FIB lithography process, called NERIME (negative resist image by dry etching). The NERIME process is a single-layer resist scheme, which implements a Ga+ FIB exposure of DNQ/novolak-based resists, followed by a near-ultraviolet (NUV) flood exposure, silylation, and oxygen dry etching. The NERIME process could not only yield both positive and negative images, but also achieve a nanometer resolution down to 65 nm and a high aspect ratio for the processed patterns. The principle of the negative image formation was also investigated by TEM and found to be due to the creation of a thin gallium oxide mask layer during etching. The NERIME process could be utilized for specific CMOS processing steps for the next generation technology nodes, such as high-resolution lithography over topographical surfaces." @default.
- W1964092015 created "2016-06-24" @default.
- W1964092015 creator A5025079590 @default.
- W1964092015 creator A5028068680 @default.
- W1964092015 creator A5033056989 @default.
- W1964092015 creator A5048833754 @default.
- W1964092015 creator A5052610168 @default.
- W1964092015 date "2004-07-01" @default.
- W1964092015 modified "2023-10-15" @default.
- W1964092015 title "A novel focused-ion-beam lithography process for sub-100 nanometer technology nodes" @default.
- W1964092015 cites W1989917373 @default.
- W1964092015 cites W2000462326 @default.
- W1964092015 cites W2005279107 @default.
- W1964092015 cites W2056518489 @default.
- W1964092015 cites W2068987881 @default.
- W1964092015 cites W2075903336 @default.
- W1964092015 cites W2080622319 @default.
- W1964092015 cites W2088558249 @default.
- W1964092015 cites W2132985166 @default.
- W1964092015 doi "https://doi.org/10.1016/j.spmi.2004.08.030" @default.
- W1964092015 hasPublicationYear "2004" @default.
- W1964092015 type Work @default.
- W1964092015 sameAs 1964092015 @default.
- W1964092015 citedByCount "18" @default.
- W1964092015 countsByYear W19640920152013 @default.
- W1964092015 countsByYear W19640920152014 @default.
- W1964092015 countsByYear W19640920152016 @default.
- W1964092015 countsByYear W19640920152020 @default.
- W1964092015 countsByYear W19640920152022 @default.
- W1964092015 crossrefType "journal-article" @default.
- W1964092015 hasAuthorship W1964092015A5025079590 @default.
- W1964092015 hasAuthorship W1964092015A5028068680 @default.
- W1964092015 hasAuthorship W1964092015A5033056989 @default.
- W1964092015 hasAuthorship W1964092015A5048833754 @default.
- W1964092015 hasAuthorship W1964092015A5052610168 @default.
- W1964092015 hasConcept C111919701 @default.
- W1964092015 hasConcept C120665830 @default.
- W1964092015 hasConcept C121332964 @default.
- W1964092015 hasConcept C145148216 @default.
- W1964092015 hasConcept C159985019 @default.
- W1964092015 hasConcept C161866238 @default.
- W1964092015 hasConcept C163581340 @default.
- W1964092015 hasConcept C168834538 @default.
- W1964092015 hasConcept C171250308 @default.
- W1964092015 hasConcept C192562407 @default.
- W1964092015 hasConcept C200274948 @default.
- W1964092015 hasConcept C204223013 @default.
- W1964092015 hasConcept C2779227376 @default.
- W1964092015 hasConcept C2781048479 @default.
- W1964092015 hasConcept C41008148 @default.
- W1964092015 hasConcept C49040817 @default.
- W1964092015 hasConcept C50774322 @default.
- W1964092015 hasConcept C53524968 @default.
- W1964092015 hasConcept C62520636 @default.
- W1964092015 hasConcept C70520399 @default.
- W1964092015 hasConcept C77066764 @default.
- W1964092015 hasConcept C98045186 @default.
- W1964092015 hasConceptScore W1964092015C111919701 @default.
- W1964092015 hasConceptScore W1964092015C120665830 @default.
- W1964092015 hasConceptScore W1964092015C121332964 @default.
- W1964092015 hasConceptScore W1964092015C145148216 @default.
- W1964092015 hasConceptScore W1964092015C159985019 @default.
- W1964092015 hasConceptScore W1964092015C161866238 @default.
- W1964092015 hasConceptScore W1964092015C163581340 @default.
- W1964092015 hasConceptScore W1964092015C168834538 @default.
- W1964092015 hasConceptScore W1964092015C171250308 @default.
- W1964092015 hasConceptScore W1964092015C192562407 @default.
- W1964092015 hasConceptScore W1964092015C200274948 @default.
- W1964092015 hasConceptScore W1964092015C204223013 @default.
- W1964092015 hasConceptScore W1964092015C2779227376 @default.
- W1964092015 hasConceptScore W1964092015C2781048479 @default.
- W1964092015 hasConceptScore W1964092015C41008148 @default.
- W1964092015 hasConceptScore W1964092015C49040817 @default.
- W1964092015 hasConceptScore W1964092015C50774322 @default.
- W1964092015 hasConceptScore W1964092015C53524968 @default.
- W1964092015 hasConceptScore W1964092015C62520636 @default.
- W1964092015 hasConceptScore W1964092015C70520399 @default.
- W1964092015 hasConceptScore W1964092015C77066764 @default.
- W1964092015 hasConceptScore W1964092015C98045186 @default.
- W1964092015 hasIssue "1-3" @default.
- W1964092015 hasLocation W19640920151 @default.
- W1964092015 hasOpenAccess W1964092015 @default.
- W1964092015 hasPrimaryLocation W19640920151 @default.
- W1964092015 hasRelatedWork W2000675294 @default.
- W1964092015 hasRelatedWork W2068910694 @default.
- W1964092015 hasRelatedWork W2081816880 @default.
- W1964092015 hasRelatedWork W2135099569 @default.
- W1964092015 hasRelatedWork W2147463886 @default.
- W1964092015 hasRelatedWork W2320505879 @default.
- W1964092015 hasRelatedWork W2466219710 @default.
- W1964092015 hasRelatedWork W2541384682 @default.
- W1964092015 hasRelatedWork W40399828 @default.
- W1964092015 hasRelatedWork W806091262 @default.
- W1964092015 hasVolume "36" @default.
- W1964092015 isParatext "false" @default.
- W1964092015 isRetracted "false" @default.
- W1964092015 magId "1964092015" @default.
- W1964092015 workType "article" @default.