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• W1964261567 endingPage "403" @default.
• W1964261567 startingPage "397" @default.
• W1964261567 abstract "Arsenic, antimony, and bismuth have been diffused into (111) silicon from doped expitaxially deposited source layers in a flowing hydrogen atmosphere. Under intrinsic conditions, the dopant profiles show excellent Fickian behavior. The diffusion coefficients, obtained as a function of temperature, can be described by the following equations: ${D}_{mathrm{As}}=6.55ifmmodetimeselsetexttimesfi{}{10}^{ensuremath{-}2}ifmmodetimeselsetexttimesfi{}frac{mathrm{exp}(ensuremath{-}3.44ifmmodepmelsetextpmfi{}0.04 mathrm{eV})}{mathrm{kT}}$ ${mathrm{cm}}^{2}$/sec; ${D}_{mathrm{Sb}}=2.14ifmmodetimeselsetexttimesfi{}{10}^{ensuremath{-}1}frac{mathrm{exp}(ensuremath{-}3.65ifmmodepmelsetextpmfi{}0.05 mathrm{eV})}{mathrm{kT}}$ ${mathrm{cm}}^{2}$/sec; and ${D}_{mathrm{Bi}}=1.08frac{mathrm{exp}(ensuremath{-}3.85ifmmodepmelsetextpmfi{}0.06 mathrm{eV})}{mathrm{kT}}$ ${mathrm{cm}}^{2}$/sec. These data, together with those of phosphorus reported earlier, are shown to be consistent with a point-defect mechanism that involves a closely coupled vacancy-impurity ensemble." @default.
• W1964261567 created "2016-06-24" @default.
• W1964261567 creator A5003759437 @default.
• W1964261567 date "1971-01-15" @default.
• W1964261567 modified "2023-09-26" @default.
• W1964261567 title "Donor Diffusion Dynamics in Silicon" @default.
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• W1964261567 doi "https://doi.org/10.1103/physrevb.3.397" @default.
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